METHOD FOR PLASMA-ACTIVATED REACTIVE DEPOSITION OF ELECTRICALLY CONDUCTIVE MULTI-COMPONENT MATERIAL FROM A GAS PHASE

摘要

The multilayer structure consists of several individual layers, the individual layers having a thickness of less than 100 nm and the individual layer structure can be virtually compensated by heating to operating temperature. Uniform electrically conductive multicomponent material is deposited on an electrically conductive substrate by a PCVD process. A plasma, for example a glow discharge plasma, a high frequency plasma or a microwave plasma, is produced in a reaction space. The plasma is moved periodically to and fro. Starting materials for the individual components of the multicomponent material are added to a flowing gas phase. In order to obtain multicomponent material of the desired composition, the flowing gas phase is divided into at least two flowing gas phases, each of which contains only starting material for an individual component of the multicomponent material. The individual gas phases are fed in succession to the plasma. The deposited multicomponent material is optionally subjected to a heat treatment. IMAGE