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Process for the plasma-activated reactive deposition of a multi-component conductive material from a gas phase
Process for the plasma-activated reactive deposition of a multi-component conductive material from a gas phase
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机译:从气相进行等离子体活化的多组分导电材料的反应性沉积的方法
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摘要
Electrically conductive multicomponent material is deposited on a tubular substrate (3) by means of a PCVD method. A plasma (9) is produced between an inner electrode (13) and an outer electrode, one of which is tubular and serves as a substrate. In order to obtain multicomponent material of the desired composition, the composition of the gas phase is changed as a function of time and/or place. In particular when metalorganic starting compounds are used, PCVD of many single layers together with an intermittent, for example, Ar/O2 plasma intermediate treatment yields an efficient removal of undesired carbon or fluorine from the deposited multicomponent material already during its manufacture.
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