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Method of reactive ion etching molybdenum and molybdenum silicide
Method of reactive ion etching molybdenum and molybdenum silicide
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机译:反应离子刻蚀钼和硅化钼的方法
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摘要
The method of reactive ion etching molybdenum or molybdenum silicide include the steps of placing a sample (4) to be etched on one of two opposed electrodes (2, 3) in a vacuum chamber (1), charging an etching gas into the chamber, applying high frequency electrical power to the electrodes to generate a discharge between them, and etching the exposed portion of the sample. The gas is a mixture of chlorine and oxygen, with the oxygen flow rate being less than about 30% of the total flow rate of the mixture.
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