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Silicon-impregnated porous polycrystalline diamond compact and its manufacturing method

机译:含硅多孔聚晶金刚石复合片及其制造方法

摘要

Disclosed is a method for producing a polycrystalline diamond compact which comprises providing a thermally-stable compact comprising between about 70% and 95% by volume diamond, characterized by a network of interconnected, empty pores dispersed throughout, and containing between about 0.05% and 3% by volume of a catalyst/sintering aid material; and subjecting said thermally-stable compact and a silicon material to a partial vacuum at an elevated temperature for a time adequate for said silicon material to infiltrate into said compact pores. The silicon material has a melting point not above about 1410 DEG C and preferably is a silicon alloy having a melting point range of between about 800 DEG and 1400 DEG C.
机译:公开了一种生产多晶金刚石压块的方法,该方法包括提供一种热稳定的压块,该热稳定的压块包含按体积计约70%至95%的金刚石,其特征在于遍布彼此的互连的空孔网络,并且包含约0.05%至3%催化剂/烧结助剂的体积百分比;使所述热稳定的压块和硅材料在升高的温度下经受部分真空达足以使所述硅材料渗透到所述压块孔中的时间。硅材料的熔点不高于约1410℃,并且优选是熔点在约800℃至1400℃之间的硅合金。

著录项

  • 公开/公告号KR900007725A

    专利类型

  • 公开/公告日1990-06-01

    原文格式PDF

  • 申请/专利权人 아더 엠. 킹;

    申请/专利号KR19890017406

  • 发明设计人 현삼조;

    申请日1989-11-29

  • 分类号C01B31/06;

  • 国家 KR

  • 入库时间 2022-08-22 06:12:33

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