首页> 外国专利> Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves

Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves

机译:用于增强高频电磁波产生的高压和大气等离子体中化学处理的装置和方法

摘要

An apparatus and method for creating high temperature plasmas for enhanced chemical processing of gaseous fluids, toxic chemicals, and the like, at a wide range of pressures, especially at atmospheric and high pressures includes an electro-magnetic resonator cavity, preferably a reentrant cavity, and a wave guiding structure which connects an electro- magnetic source to the cavity. The cavity includes an intake port and an exhaust port, each having apertures in the conductive walls of the cavity sufficient for the intake of the gaseous fluids and for the discharge of the processed gaseous fluids. The apertures are sufficiently small to prevent the leakage of the electro-magnetic radiation from the cavity. Gaseous fluid flowing from the direction of the electro-magnetic source through the guiding wave structure and into the cavity acts on the plasma to push it away from the guiding wave structure and the electro- magnetic source. The gaseous fluid flow confines the high temperature plasma inside the cavity and allows complete chemical processing of the gaseous fluids at a wide range of pressures.
机译:用于产生高温等离子体以增强气态流体,有毒化学物质等的化学处理的设备和方法,其在很宽的压力范围内,尤其是在大气压和高压下,包括电磁谐振腔,最好是折返腔,波导结构将电磁源连接到空腔。腔包括进气口和排气口,每个进气口和排气口在腔的导电壁上具有孔,这些孔足以吸入气态流体并排出处理过的气态流体。孔足够小以防止电磁辐射从腔泄漏。从电磁源的方向流过导波结构并进入空腔的气态流体作用在等离子体上,将其推离导波结构和电磁源。气态流体流将高温等离子体限制在腔体内,并允许在很大的压力范围内对气态流体进行完整的化学处理。

著录项

  • 公开/公告号US4883570A

    专利类型

  • 公开/公告日1989-11-28

    原文格式PDF

  • 申请/专利权人 RESEARCH-COTTRELL INC.;

    申请/专利号US19870060048

  • 发明设计人 DENNIS J. HELFRITCH;PHILIP C. EFTHIMION;

    申请日1987-06-08

  • 分类号H01J7/46;H01J19/80;H01J19/12;

  • 国家 US

  • 入库时间 2022-08-22 06:08:14

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