halbleitervorrichtung with trace, the good kantenbekleidung to kontaktloechern possesses.

摘要

Step coverage of wiring layer (ll) of semiconductor device especially at the contact holes (5, 6) is improved. Inside of the contact holes (5, 6) is covered by polysilicon layer (7, 8, 9) deposited by chemical vapor deposition (CVD); and selectively doped with impurities having same conductivity type of the contact region (2, 3) to which the polysilicon layer (7, 8, 9) is contacted at the bottom of the contact holes (5, 6). The remaining parts of the contact holes (5, 6) are buried with SiO2, and the wiring layer (ll) is formed on it. Since the step coverage of the material deposited by CVD is very good, the disconnection at the side walls of the contact holes (5, 6) is avoided. The short circuits caused by growth of spikes of eutectic of silicon and aluminium is also avoided. If the surface of the polysilicon layer (7, 8, 9) is covered by a thin film (2l) of SiO2 or Si3N4, the material to bury the contact hole (5, 6) may be replaced by other material polysilicon or amorphous silicon for instance. Further a barrier layer (23) is provided between the wiring layer (ll) and the polysilicon layer (7, 8, 9). This prevents the migration of aluminium over the polysilicon, so the reliability of the wiring is further improved. The barrier layer (23) is made from silicide of high melting point metal or the metal itself. This improves the conduction between the contact region and the wiring layer.