Coating substrate with metal (alloy) - by magnetic sputtering, with substrate mounted on surface held at negative voltage

摘要

Substrate is coated with a metal or metal alloy by magnetic sputtering, the substrate being mounted on a surface held at a negative voltage and moved repeatedly before a target of the magnetron. By using of mounting surfaces larger in area than the target surfaces, the substrate is exposed to an additional ion current, produced by a glow cathode outside the magnetron magnetic field emitting electrons which are removed by an anode positioned in front of the target edge. A W cathode is used as glow electrode and is held at 2200-3000 deg.C. Voltage of more than 0V-60V is maintained between glow cathode and anode. Additional ion current density is 0.05-5 mA/cm2. ADVANTAGE - Reproducibility of coating characteristics is improved.