首页> 外国专利> Method of preparation, by cathodic sputtering, thin films of a multilayer magnetic substance and silver, with the pharmacological magnetic and / or magneto - optic improved

Method of preparation, by cathodic sputtering, thin films of a multilayer magnetic substance and silver, with the pharmacological magnetic and / or magneto - optic improved

机译:通过阴极溅射制备多层磁性物质和银的薄膜的方法,其药理磁性和/或磁光

摘要

Method of preparation of multilayer thin films of a Fe, Co, Ni magnetic substance and their alloys, consisting in depositing the thin films by RF cathode sputtering, for the magnetic substance, with a deposition rate of 2-3 nm/min, and by RF-magnetron cathode sputtering for the silver, with a deposition rate of 6-10 nm/min. The multilayer thin films thus obtained have improved magnetic and/or magneto optical properties, compared to the properties of the magnetic substance. They can be used as a magnetic material in devices using magnetic and/or magneto-optical effects.
机译:Fe,Co,Ni磁性物质及其合金的多层薄膜的制备方法,包括通过RF阴极溅射以2-3nm / min的沉积速率沉积磁性物质的薄膜,以及通过RF-磁控管阴极溅射银,沉积速率为6-10 nm / min。与磁性物质的性质相比,如此获得的多层薄膜具有改善的磁性和/或磁光学性质。它们可用作使用磁和/或磁光效应的设备中的磁性材料。

著录项

  • 公开/公告号FR2648828B1

    专利类型

  • 公开/公告日1991-10-04

    原文格式PDF

  • 申请/专利权人 CENTRE NAL RECHERC SCIENTIFIQUE;

    申请/专利号FR19890008339

  • 发明设计人 RAMANATHAN KRISHNAN;MICHEL TESSIER;

    申请日1989-06-22

  • 分类号C23C14/34;C23C14/14;G02F1/09;G11B5/62;H01F41/14;

  • 国家 FR

  • 入库时间 2022-08-22 05:48:26

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