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Optical film thickness measuring device for measuring two-layer film thicknesses using spectral reflectance

机译:用于使用光谱反射率测量两层膜厚度的光学膜厚度测量装置

摘要

The optical film thickness measuring device comprises a spectral reflectance measuring device for measuring spectral reflectance of two layers of a two-layer optical film, a memory device for storing, as reflectance data theoretical values of optical thickness and refractive index of each layer of the two-layer optical film as well as those of reflectance of the two-layer optical film, a data selecting device for selectively reading out the reflectance data corresponding to the measuring wavelengths for measured values of spectral reflectance and a film thickness deciding means for determining thickness of each layer of the two-layer optical film on the basis of the selected reflectance data and the measured spectral reflectance. This optical film thickness measuring device is capable of quickly and accurately measuring thickness of each layer of two-layer optical films.
机译:光学膜厚测量装置包括:光谱反射率测量装置,用于测量两层光学膜的两层的光谱反射率;存储装置,用于将两层的光学厚度和折射率的理论值作为反射率数据存储。层光学膜以及两层光学膜的反射率,用于选择性地读出与光谱反射率的测量值的测量波长相对应的反射率数据的数据选择装置以及用于确定膜厚的膜厚度确定装置基于选择的反射率数据和测得的光谱反射率,两层光学膜的每一层。该光学膜厚测量装置能够快速且准确地测量两层光学膜的每一层的厚度。

著录项

  • 公开/公告号US4999508A

    专利类型

  • 公开/公告日1991-03-12

    原文格式PDF

  • 申请/专利权人 OLYMPUS OPTICAL CO. LTD.;

    申请/专利号US19890459276

  • 发明设计人 KAZUSHI HYAKUMURA;

    申请日1989-12-29

  • 分类号G01N21/86;

  • 国家 US

  • 入库时间 2022-08-22 05:46:49

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