ION CLUSTER BEAM VAPOR DEPOSITION METHOD AND DEVICE

摘要

PURPOSE:To suppress the reaction of a material 2 to be deposited by evaporation by using a laser 61 as a heating means for the material 2 to be deposited by evaporation. CONSTITUTION:In the method and device for vapor deposition consisting in clustering the particles of the material 2 to be deposited by evaporation, then ionizing the clusters, adding kinetic energy to the ions to accelerate the ions and depositing the thin film of the material to be deposited by evaporation on a substrate by evaporation, while the above-mentioned material to be deposited by evaporation is held locally melted 21, the particles 22 of the material to be deposited by evaporation are sprayed to deposit the thin film of the material to be deposited by evaporation on the substrate 5 by evaporation and a laser beam source 6 is used as the source for generating the ion cluster beam. A shielding matter 7 which shields the optical path of the laser in synchronization with the irradiation stop of the laser 61 is provided between the above- mentioned laser beam source 6 and the material 2 to be deposited by evaporation.