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PALLADIUM-NICKEL-PHOSPHORUS ALLOY ELECTROPLATING SOLUTION

机译:钯-镍-磷合金电镀解决方案

摘要

PURPOSE:To obtain an electroplating soln. giving a Pd-Ni-P alloy plating film contg. relieved stress, free from cracks and having satisfactory corrosion resistance by specifying the compsn. of an aq. soln. so that P is codeposited in a Pd-Ni alloy plating film. CONSTITUTION:This plating soln. is an aq. soln. contg. 0.01-0.5mol/l Pd compd., 0.01-1mol/l Ni compd., 0.02-1mol/l amine compd. and 0.001-0.5mol/l one or more kinds of P-contg. compds. selected among phosphorous acid and hypophosphorous acid compds. In the case of 0.01mol/l Pd compd., current efficiency is reduced and 0.5mol/l Pd compd. deteriorates the stability of the soln. without further increasing current efficiency. In the case of 0.01mol/l Ni compd., Ni codeposits hardly and 1mol/l Ni compd. deteriorates the stability of the soln. The amine compd. contributes toward stabilizing the soln. but 1mol/l amine compd. is uneconomical and 0.02mol/l amine compd. does not ensure stability. In the case of 0.001mol/l P-contg. compds., P codeposits hardly and 0.5mol/l P-contg. compds. deteriorate the appearance of a plating film.
机译:目的:获得电镀液。得到连续的Pd-Ni-P合金镀膜。通过指定组合件,可释放应力,无裂纹且具有令人满意的耐腐蚀性。的soln。因此,P共沉积在Pd-Ni合金镀膜中。组成:这种电镀液。是水溶液soln。续钯含量为0.01-0.5mol / l,镍含量为0.01-1mol / l,胺含量为0.02-1mol / l。 0.001-0.5mol / l的一种或多种P-contg。 compds。选自亚磷酸和次磷酸的化合物。如果Pd小于0.01mol / l,电流效率会降低,Pd大于0.5mol / l。降低了锡的稳定性。无需进一步提高电流效率。在Ni小于0.01mol / l的情况下,Ni几乎不共沉积,而Ni大于1mol / l。降低了锡的稳定性。胺类化合物。有助于稳定溶液。但胺含量> 1mol / l。是不经济的,胺含量小于0.02mol / l。无法确保稳定性。在<0.001mol / l的情况下P-contg。 P几乎不沉积,P浓度> 0.5mol / l。 compds。镀膜的外观变差。

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