PRODUCTION OF THIN VANADIUM PENTOXIDE FILM

摘要

PURPOSE:To facilitate the increase of the area of an element as well as to enable film formation by a simple process at a low cost by coating a substrate with a soln. prepd. by dissolving vanadium pentoxide and a reducing agent in an org. solvent and heating the coated substrate. CONSTITUTION:A substrate is coated with a soln. prepd. by dissolving vanadium pentoxide and a reducing agent in an org. solvent and the coated substrate is heated preferably at 300-600 deg.C. The reducing agent used is not especially limited and may be an inorg. reducing agent such as H2S, an alkali metal or lithium hydride or an org. reducing agent such as benzyl alcohol or hydrazine but a thermally decomposable org. reducing agent is preferably used so as to obtain a thin vanadium pentoxide film having high purity. Isobutyl alcohol, n-butyl alcohol or isopropyl alcohol well dissolving reduced vanadium and having moderate dryability at the time of film formation is preferably used as the org. solvent.