RISE OF MASS PRODUCTION IN SEMICONDUCTOR MANUFACTURING PROCESS, INSPECTION OF FOREIGN SUBSTANCE IN MASS PRODUCTION LINE AND DEVICE THEREOF

摘要

PURPOSE:To maximize foreign substance detection, analysis and evaluation functions necessary at the rising time of mass production, to reduce a production line at the time of the mass production and to make possible a reduction in the cost of the manufacture of a semiconductor by a method wherein a detection, analysis and evaluation system for foreign substances at the rising time of the mass production is separated from a mass production line and results obtained by the system are monitored by a simple monitoring device only in the mass production line. CONSTITUTION:When the control situation of foreign substances on a material, in a process, on a device and in an environment is evaluated using sampling wafers 401 to 405 at the rising time of mass production in a semiconductor manufacturing process, a detection, analysis and evaluation system 1002 for the foreign substances at the rising time of the mass production is separated from a mass production line and results obtained by the system 1002 are fed-back to the mass production line and are monitored by a simple monitoring device 1001 only in the mass production line. For example, in the above foreign substance detection, analysis and evaluation system 1002, foreign substances on sampling wafers 401 to 405 are detected and thereafter, the kinds of the elements of the foreign substances are analyzed by an STM/ STS 603. The analyzed data is ready-stored in advance as data base and the data base is compared with data on an object to be analyzed. Thereby, the kinds of the elements of the foreign substances are decided.