DEVICE FOR COATING SUBSTRATE BY ADDITION REACTION OF PLASMA-EXCITED ATOMS OR MOLECULES

摘要

device for coating substrates by a plasma excited by a anlagerungsreaktion of atoms and molecules.a process chamber (1) with at least one mikrowellendurchlu00e4ssigen window (22, 23) with at least one outside the chamber (1) and the window (22, 23) arranged waveguide structure (16, 17) in the chamber, and with a proper verteilungseinrichtung (25) are provided.to solve the task, and to facilitate maintenance and repairs, erfindungsgemu00e4u00df suggested that the mikrowellendurchlu00e4ssige window (22, 23), at least one waveguide structure (16, 17) and the verteilungseinrichtung (25) together. in a tragrahmen (10) are attached, as a unit from the process chamber (1) and a removable wegschwenkbar.