首页> 外国专利> Use of reactive substrate in thick film resistor mfr. - has thick dielectric layer acting as adhesion promoter and insulating layer, between resistor layer and substrate

Use of reactive substrate in thick film resistor mfr. - has thick dielectric layer acting as adhesion promoter and insulating layer, between resistor layer and substrate

机译:在厚膜电阻器mfr中使用反应性基板。 -在电阻层和基板之间具有厚的介电层,用作粘合促进剂和绝缘层

摘要

Layered devices with conductor and resistor layers in thick film technology are made on substrates of pref. Y-Fe-garnet, ferrite or AlN. The feature is that a dielectric layer, which acts as adhesion promoter and insulating layer, is provided between the resistor layer and the substrate. In the pref. process the dielectric layer is first printed and fired, then the conductor layer is printed and fired, and possibly additional layers individually fired, and finally the resistor layer is printed and fired, pref. as a paste compatible with a conductor layer using Cu, Ag, Ag/Pd or Au/Pd. A final coating layer can be deposited and/or a noble metal layer applied. USE/ADVANTAGE - The intermediate dielectric layer allows resistor layers to be used which would react with the substrate material in the absence of the layer, either during firing or during laser trimming.
机译:厚膜技术中具有导体层和电阻层的分层设备是在首选基材上制造的。 Y-Fe-石榴石,铁氧体或AlN。其特征在于,在电阻器层与基板之间设置有用作粘合促进剂和绝缘层的介电层。在首选。在此过程中,首先印刷和烧制介电层,然后印刷和烧制导体层,并可能单独烧制其他层,最后再印刷和烧制电阻器层。作为与使用Cu,Ag,Ag / Pd或Au / Pd的导体层兼容的糊剂。可以沉积最终涂层和/或涂覆贵金属层。使用/优点-中间介电层允许使用电阻层,该电阻层会在烧结或激光修整过程中在不存在该层的情况下与基材发生反应。

著录项

  • 公开/公告号DE4100865A1

    专利类型

  • 公开/公告日1992-07-16

    原文格式PDF

  • 申请/专利权人 SIEMENS AG 8000 MUENCHEN DE;

    申请/专利号DE19914100865

  • 发明设计人 RATZ RICHARD DR. 8011 BRUNNTHAL DE;

    申请日1991-01-14

  • 分类号H05K1/16;H01L27/13;H05K3/12;

  • 国家 DE

  • 入库时间 2022-08-22 05:25:46

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