PURPOSE:To provide the subject composition high in photosensitivity, capable of giving good resist patterns with little residual development, comprising a compound having group instable to acids, a compound generating an acid on active ray irradiation, and specific benzotriazole compound(s). CONSTITUTION:The objective composition comprising (A) as a compound having group instable to acids, a polymeric compound containing t-amyloxycarbonyl group, prepared by radical copolymerization between methacrylic acid, t-amyl methacrylate and n-butyl acrylate, (B) a compound generating an acid on active ray irradiation (e.g. p-nitrobenzyl-9,10-diethoxyanthracene-2-sulfonate), and (C) benzotriazole derivative(s) of formula I (R1 is H, halogen, OH, alkyl or alkoxy; R2 us H, OH, alkyl, ester, phenyl, etc.; n is 1-3) and/or formula II (R4 is H, alkyl or phenyl).
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机译:用途:为了提供具有高光敏性的主题组合物,其能够提供具有几乎不残留显影的良好的抗蚀剂图案,包括具有对酸不稳定的基团的化合物,在活性射线照射下产生酸的化合物以及特定的苯并三唑化合物。组成:一种目标组合物,其包含(A)一种具有对酸不稳定的基团的化合物,一种通过甲基丙烯酸,甲基丙烯酸叔戊酯和丙烯酸正丁酯之间的自由基共聚制备的,含有叔戊氧基羰基的高分子化合物,(B)一种化合物在活性射线照射下产生酸(例如对硝基苄基-9,10-二乙氧基蒽-2-磺酸盐)和式(I)的苯并三唑衍生物(R 1为H,卤素,OH,烷基或烷氧基; R 2为H,OH,烷基,酯,苯基等; n为1-3)和/或式II(R 4为H,烷基或苯基)。
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