Method for measuring deviations of the layers in a multilayer device and apparatus to realise this method

摘要

A description is given of a method of measuring the mutual deviation of layers of a multilayer arrangement which are provided with conductor tracks. Knowledge of the deviation makes it possible to specify in each case a suitable position for the holes to be subsequently drilled through the multilayer arrangement to electrically connect the conductor track levels. For this purpose, each layer has an optically detectable pattern in a specified position, said patterns overlapping at least partially in the multilayer arrangement. At least one inspection hole is drilled in the multilayer arrangement which intersects the patterns in each layer. The cut edges of each pattern are registered optically in the inspection hole and their position is used to determine the mutual displacement of the layers.