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PROCESS FOR CLEANING PRECISION OPTICS OR OPTICAL ASSEMBLIES WITHOUT PRODUCING EMISSIONS, ESPECIALLY CFCs

机译:在不产生排放物(尤其是氟氯化碳)的情况下清洁精密光学或光学组件的过程

摘要

Without a precision optical elements emissions cleaning process comprises the following steps: (a) a pretreatment which comprises cleaning in a bath containing buffered tap water, to which is added surfactants as an wetting agent, the bath being circulated and finely filtered, the cleaning being accompanied by exposure to ultrasound, preferably at frequencies and varying amplitudes; the optical elements are then rinsed with buffered tap water without wetting agents, with exposure to ultrasound, while fresh water is finely filtered; a new cleaning and rinsing again follow, and a rinse with water buffered deionized, with exposure to ultrasound and stirring with deionized water at the same time that the bath is finely filtered; (B) decomposition of organic impurities and residues of surfactants to transform them into CO2 by exposure to short-wave UV radiation or highly accelerated electrons or a glow discharge in an atmosphere of oxygen pressure or under a pressure of up to 5 bar or in an ozone atmosphere pressure or under a pressure of up to 2 bars; (C) control interfaces of glass optical elements with respect to reactions with organic radicals, decomposition reactions at the glass surface or changes in the surface geometry; (D) a main processing consisting of the steps of: expelling water to the glass surface, for example by means of non-volatile hydrophobic reactive substances or non-volatile hydrophobic substances; sealing the surface by forming a film by exposure to UV or electron rays and surface coating, while the surface sealing layer is decomposed into a metal oxide or glow discharge is activated by corona discharge. The optical component according to this cleaned
机译:在没有精密光学元件的情况下,排放物清洁过程包括以下步骤:(a)预处理,该过程包括在装有缓冲自来水的浴中进行清洁,向其中添加表面活性剂作为润湿剂,使浴液循环并精细过滤,清洁伴有超声波,最好是在频率和幅度变化的情况下;然后将光学元件用不含润湿剂的缓冲自来水冲洗,并在暴露于超声波的情况下进行冲洗,同时对淡水进行精细过滤。再次进行新的清洗和漂洗,并用缓冲的去离子水冲洗,并在对超声波进行细微过滤的同时,将其暴露于超声波中并用去离子水搅拌; (B)在氧气压力下或在最高5 bar的压力下或在高压下通过暴露于短波UV辐射或高度加速的电子或辉光放电将有机杂质和表面活性剂的残留分解为CO2臭氧气压或最高2 bar的压力; (C)关于与有机自由基的反应,在玻璃表面的分解反应或表面几何形状的变化的玻璃光学元件的控制界面; (D)主要处理步骤,其包括以下步骤:-例如通过非挥发性疏水反应性物质或非挥发性疏水物质将水排放到玻璃表面;通过暴露于紫外线或电子射线并进行表面涂层形成膜来密封表面,同时将表面密封层分解为金属氧化物或通过电晕放电激活辉光放电。根据此清洁的光学组件

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