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PROCESS FOR CLEANING PRECISION OPTICS OR OPTICAL ASSEMBLIES WITHOUT PRODUCING EMISSIONS, ESPECIALLY CFCs

机译:在不产生排放物(尤其是氟氯化碳)的情况下清洁精密光学或光学组件的过程

摘要

a cleaning process without emissions of precision optical elements comprises the following steps: (a) a pre processing, which includes cleaning a bath with the tap water, buffered plus surfactants as wetting agent, the bath... ant released and finely filtering, cleaning is accompanied by exposure to ultrasound.preferably with variable frequencies and amplitudes. the optical elements are then rinsed with tap water and buffered without wetting agents, exposure to ultrasound, so that fresh water is finely filtered; a cleaning and rinsing a new you s, as well as a rincage buffered with deionized water.with exposure to ultrasound and agitation with the deionized water, at the same time, the bath is finely filtered; (b) the decomposition of organic impurities and remnants of surfactants to transform them into co2 by exposure to short wave uv radiation, or highly accelerated electrons or a glow discharge.in an atmosphere of oxygen without pressure or under a pressure of up to 5 bar, or in an atmosphere of ozone without pressure or under a pressure of up to 2 bars; (c) control of the interfaces of the glass optical elements which is feedback with organic radicals.decomposition reaction on the surface of the glass or changes in the geometry of the surface; and (d) a primary treatment, consisting of the following steps: removal of the water at the surface of the glass.for example, by means of reactive hydrophobic, hydrophobic substances, not volatile or non-volatile, sealing of the surface by the formation of a film by exposure to uv or electronic and surface coating, so that the sealing surface is a layer of into a metal oxide by glow discharge and is activated by glow discharge.the optical component is cleaned according to the
机译:不排放精密光学元件的清洁过程包括以下步骤:(a)预处理,包括用自来水,缓冲液和表面活性剂作为润湿剂清洁浴液,浴液释放,并进行精细过滤,清洁伴有超声波照射,最好具有可变的频率和振幅。然后将光学元件用自来水冲洗,并在没有润湿剂的情况下进行缓冲,使其暴露于超声波中,以便对淡水进行精细过滤。清洗和冲洗新产品,以及用去离子水缓冲的废品。在超声波和去离子水搅动下,同时对滤池进行精细过滤; (b)在氧气中,无压力或压力高达5 bar的条件下,通过暴露于短波uv辐射,高度加速的电子或辉光放电将有机杂质和表面活性剂的残留物分解成二氧化碳,或在无压力或不超过2巴的压力下的臭氧气氛中; (c)控制玻璃光学元件的界面,该界面由有机自由基反馈,玻璃表面上的分解反应或表面几何形状的变化; (d)初步处理,包括以下步骤:去除玻璃表面的水。例如,通过反应性疏水,疏水性物质(非挥发性或非挥发性),通过玻璃对表面进行密封通过暴露于uv或电子和表面涂层形成薄膜,从而使密封表面通过辉光放电形成一层金属氧化物,并通过辉光放电活化。根据

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