首页> 外国专利> Regeneration of sulphuric acid, per:oxo:di:sulphate etching solns. contg. copper - by using a process requiring no interruptions for accumulated copper@ removal

Regeneration of sulphuric acid, per:oxo:di:sulphate etching solns. contg. copper - by using a process requiring no interruptions for accumulated copper@ removal

机译:硫酸的再生:过氧化物:二硫酸盐蚀刻液。续铜-使用不中断铜累积清除的工艺

摘要

The method for regeneration of sulphuric-acid, peroxodisulphate etching solutions containing copper consists of cathodic reduction and precipitation of the bulk of copper in a copper recovery cell, followed by copper precipitation and regeneration of the peroxodisulphate respectively in the cathode and anode spaces of a divided peroxodisulphate regeneration cell. The solution from the copper recovery cell has a residual copper content from 0.05 to 5 g/litre. With optimal adjustment of the regeneration cell, regeneration of the etching solution can be carried out with an energy consumption of 1/7 kWh per kg of sodium peroxodisulphate. The cell operates with bubble-driven catholyte circulation and continuous removal of precipitated residual copper by means of integrated solid/liquid separation stages. USE/ADVANTAGE - The process can be used in manufacture of printed circuit boards. It is environment-friendly and does not have to be interrupted for removal of accumulated copper.
机译:含铜的硫酸,过二硫酸盐蚀刻溶液的再生方法包括阴极还原和沉淀在铜回收池中的大部分铜,然后分别在分开的阴极和阳极空间中沉淀和再生过氧二硫酸盐。过二硫酸盐再生细胞。来自铜回收池的溶液的残留铜含量为0.05至5克/升。通过优化调节再生池,可以每公斤过氧二硫酸钠1/7 kWh的能耗进行蚀刻液的再生。该电解槽在气泡驱动的阴极电解液循环下运行,并通过集成的固/液分离阶段连续去除沉淀的残留铜。使用/优点-该工艺可用于制造印刷电路板。它对环境友好,无需中断即可去除积聚的铜。

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