A method for removal of coating from photo-cross-linked photoresist masks

摘要

it is a method of removing coating from lichtvernetzten photoresistschablonen through wu00e4u00dfrig - alkaline solutions described in the photoresistschablone first with a wu00e4u00dfrig alkaline solution of higher concentration, and then with a wu00e4u00dfrig alkaline solution. concentration and the concentration ratio of the two treated solutions will be recruitedthat the entschichtungsgeschwindigkeit in the first solution by a factor of at least 1.5 is greater than the second solution. by the two-step procedure is to replace the resistschablone in the form of smaller flakes within a shorter time.