首页> 外国专利> Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O- napthoquinonediazidosulfonic acid with polyhydroxybenzophenone

Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O- napthoquinonediazidosulfonic acid with polyhydroxybenzophenone

机译:包含特定的高分子量化合物和邻萘醌二叠氮基磺酸与聚羟基二苯甲酮的光敏酯的正性光敏平版印刷版

摘要

A positive photosensitive planographic printing plate is disclosed which has a photosensitive layer comprising in combination a specific o- naphthoquinonediazidosulfonic ester and a resin having a specific structural unit(s). Said photosensitive layer may also contain a novolak resin and/or an organic acid.
机译:公开了一种正型感光平版印刷版,其具有感光层,所述感光层包含特定的邻萘醌二叠氮基磺酸酯和具有特定结构单元的树脂。所述光敏层还可包含酚醛清漆树脂和/或有机酸。

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