首页> 外国专利> Photosensitive composition containing 1,2-naphthoquinone-2- diazido-4- sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye

Photosensitive composition containing 1,2-naphthoquinone-2- diazido-4- sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye

机译:包含1,2-萘醌-2-二叠氮-4-磺酸酯,碱溶性树脂,卤代甲基恶二唑化合物和染料的光敏组合物

摘要

A photosensitive composition comprising (a) a 1,2- naphthoquinone-2- diazido-4-sulfonic acid ester compound, (b) alkali- soluble resin, (c) a halomethyloxadiazole compound which releases halogen free radicals by irradiation with actinic rays and (a) a dye which interacts withthe decomposition product of said halomethyloxydiazole compound and discolors or develops color. The composition exhibits excellent development latitude, light safety, visible-on-exposure characteristic and printing resistance.
机译:感光性组合物,其包含(a)1,2-萘醌-2-二叠氮基-4-磺酸酯化合物,(b)碱溶性树脂,(c)通过光化射线照射释放卤素自由基的卤代甲基恶二唑化合物和(a)与所述卤代甲氧基二唑化合物的分解产物相互作用并使其变色或发色的染料。该组合物表现出优异的显影宽容度,光安全性,曝光可见特性和耐印刷性。

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