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Plasma-assisted CVD of carbonaceous films by using a bias voltage
Plasma-assisted CVD of carbonaceous films by using a bias voltage
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机译:使用偏置电压的碳膜等离子体辅助CVD
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摘要
Diamond films or I-Carbon films can be formed on a surface of an object by virtue of plasma-assisted chemical vapor deposition. The hardness of the films can be enhanced by applying a bias voltage to the object during deposition.
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