首页>
外国专利>
The plasma the purazumapatsushibe - Shaun technology null which prevents the attack after the etching treating of the aluminum film which is etched
The plasma the purazumapatsushibe - Shaun technology null which prevents the attack after the etching treating of the aluminum film which is etched
A method for preventing the post-etch corrosion of aluminum or aluminum alloy film which has been etched utilizing chlorinated plasma wherein the etched film is exposed to fluorinated plasma.
展开▼