DEEP UV-SENSITIVE PHOTORESIST COMPOSITION RESISTANT TO LATENT-IMAGE DECAY

摘要

PURPOSE: To ensure improved critical dimensional stability in a prolonged holding time between the irradiation of a resist compsn. and the baking of it after the irradiation by incorporating a specified polymer, a photo-acid generating body and carbonate esters. CONSTITUTION: This compsn. is a positive photoresist compsn. contg. an acid- stable polymer insoluble in water but usually soluble in an aq. alkali medium, a mixture of carbonate esters of polyhydric phenol and tert. butyl alcohol as acid-unstable compds. inhibiting the dissolution of the polymer and a photo-acid generating body represented by the formula, wherein Q is diazonaphthoquinone, R is H or -CH2 OS (=O) -Q, R' is I-I, hydroxy or -O-S(=O)2 -Q, R2 is H or lower alkyl, X is H or nitro, and when X is nitro, R2 is lower alkyl.