PRODUCTION OF SCRATCHING RESISTANT BASE MATERIAL HAVING ANTIREFLECTION PROPERTY, SCRATCHING RESISTANT BASE MATERIAL AND POLARIZING PLATE

摘要

PURPOSE:To provide the scratching resistant base material constituted by forming antireflection coating films which are hard cured coating films, have scratching resistance and good ray transmittance, can be easily produced and has good adhesion between the layers on the surfaces of a transparent base material, the polarizing plate formed by using such scratching resistant base material and the process for production thereof. CONSTITUTION:Lower layer coating films 2 are formed on one or both surfaces of the transparent substrate 1 by applying a resin compsn. contg. a ionization radiation curing type resin thereon. A thermoplastic resin or thermosetting resin may be incorporated into this resin compsn. The coating films 2 are half cured and the ionization radiation curing type resin having the refractive index slightly lower than the refractive index of the coating films 2 is applied thereon to form upper layer coating films 3. Both the coating films 2, 3 are simultaneously cured by irradiating the films with ionization radiations, by which the scratching resistant base material is obtd. This scratching resistant base material may be provided with moistureproof layers. The polarizing plate is obtd. by laminating this scratching resistant base material on a polarizing element.