首页> 外国专利> SCRATCH RESISTANT BASE MATERIAL HAVING REFLECTION PREVENTIVE PROPERTY AND POLARIZING PLATE

SCRATCH RESISTANT BASE MATERIAL HAVING REFLECTION PREVENTIVE PROPERTY AND POLARIZING PLATE

机译:具有防反射性能和偏光板的耐刮擦基料

摘要

PROBLEM TO BE SOLVED: To provide a scratch resistant base material which has a hard, scratch resistant coating film, is high in light transmittance and simple in production, and forms the reflection preventive coating film having good interlayer adhesion on the surface of the transparent base material and a polarizing plate using the base material.;SOLUTION: In the reflection preventive, scratch resistant base material, a lower layer coating film 2 of a resin composition containing an ionizing radiation curable resin is formed at least on one side of a transparent substrate 1, and an upper layer coating film 3 of an ionizing radiation curable resin composition having a refractive index somewhat lower than that of the ionizing radiation curable resin composition of the lower layer coating film 2 is formed on the lower layer coating film 2. The upper layer coating film 3 is made of the resin composition containing fluorine atoms.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种耐刮擦性基材,该耐刮擦性基材具有硬质的耐刮擦性涂膜,透光率高且制造简单,并且在透明基材的表面形成层间密合性良好的防反射涂膜。解决方案:在防反射,抗划伤的基材中,至少在透明基板的一侧上形成包含电离辐射固化树脂的树脂组合物的下层涂膜2。参照图1,在下层涂膜2上形成折射率比下层涂膜2的电离放射线固化性树脂组合物的折射率稍低的电离放射线固化性树脂组合物的上层涂膜3。层涂膜3由含氟原子的树脂组合物制成。版权所有:(C)2003,日本特许厅

著录项

  • 公开/公告号JP2003071990A

    专利类型

  • 公开/公告日2003-03-12

    原文格式PDF

  • 申请/专利权人 DAINIPPON PRINTING CO LTD;

    申请/专利号JP20020198573

  • 发明设计人 NAKAMURA NORINAGA;

    申请日1992-11-25

  • 分类号B32B27/08;B32B27/00;G02B1/10;G02B1/11;G02B5/30;

  • 国家 JP

  • 入库时间 2022-08-22 00:18:15

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