PRETREATING APPARATUS FOR SILICON WAFER BEFORE INSPECTION

摘要

PURPOSE: To dissociate accurate impurity pair in a silicon wafer and to stably measure an impurity element concentration by installing the wafer in a heat insulator for a predetermined time, then moving it to a cooler, and controlling its moving means. ;CONSTITUTION: An apparatus dissociates elements between lattices as a pretreatment before an element temperature of a silicon wafer 5 is measured. The apparatus comprises a heat insulator capable of controlling a temperature from the ambient temperature to a temperature to a predetermined range such as a hot chuck 2, a cooler for cooling the wafer 5 such as an aluminum block 7. The apparatus also comprises moving means (robot) 9 for moving the wafer 5 to the block 7 after the wafer 5 is placed on the chuck 2 for a predetermined time, and control means 13 for controlling the robot 9. The robot 9, the controller 6, etc., are automatically controlled by the means 13 to maintain a moving time of the wafer 5 constant.;COPYRIGHT: (C)1994,JPO&Japio