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INSPECTION METHOD FOR CIRCUIT PATTERM DEFECT AND DEFECT INSPECTION DEVICE
INSPECTION METHOD FOR CIRCUIT PATTERM DEFECT AND DEFECT INSPECTION DEVICE
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机译:电路图形缺陷和缺陷检查装置的检查方法
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摘要
PURPOSE:To enable the defect of a circuit pattern to be detected by dividing the processed data of the characteristics of a circuit pattern into each processing zone for finding a cycle per zone, computing the cycle using the number of picture elements, and the correlation amount of difference data between the processed data and new data with the number of picture elements dephased, and deducting correction data from the difference data, while the processed data is multiplied by the calculated correlation amount. CONSTITUTION:The characteristics of each picture element of a circuit pattern is quantitatively converted to prepare processed data, and this data for process is divided into each processing zone and processed, thereby obtaining the cycle of the processed data and calculating the cycle, by using the number of picture elements. Then, a data difference with the number of data picture elements dephased by an integral number is calculated and, then, difference data for the cycle is obtained. Thereafter, difference data with the processed data dephased is calculated about a range between + or -1 to + or -N. This difference data is multiplied by a correlation amount for the range to obtain correction data. Then, the correction data is deducted from the difference data and a defect in each zone is detected over a whole processing zone. The defects of all circuit pattern inspection zones are thereby detected.
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