METHOD AND DEVICE FOR PRODUCING OPTICAL THIN FILM BY ION BEAM ASSIST VAPOR DEPOSITION

摘要

PURPOSE:To form film while keeping a vapor deposition vessel at a high vacuum degree without generating the leakage of an ionized gas from a ion source to the vapor deposition vessel. CONSTITUTION:The vapor deposition vessel 4 and 2nd vacuum vessel 7 adjacent to the bottom wall of the vapor deposition vessel 4 are respectively connected to an evacuating line of a different system. A substrate holder 2 rotated by a driving part 3, a heater 8 for heating a substrate 1 supported by the substrate holder 2 at a prescribed temp. and vapor deposition source 5 for vaporizing a material to be vapor-deposited and provided with a shutter 6 are arranged in the vapor deposition vessel 4, and on the other hand, the ion source 9 for generating ion beam is arranged in the 2nd vacuum vessel 7. As a result, the film can be formed while keeping the vapor deposition vessel 4 at the high vacuum degree without generating the leakage of the ionized introduced to the ion source 9 to the vapor deposition vessel 4.