METHOD AND APPARATUS FOR HEAT-TREATING SEMICONDUCTOR, AND METHOD OF EVALUATING SEMICONDUCTOR

摘要

PURPOSE: To conduct quality inspection in a highly precise manner by controlling the atmosphere in the circumference of a semiconductor in the specific vapor pressure. ;CONSTITUTION: When a semiconductor substrate is taken out from the heat treatment part of a heat treatment device, a slight amount of moisture is added to the atmosphere around the semiconductor substrate, and the atmosphere surrounding the semiconductor is controlled to the vapor pressure of 1 to 5×10³ Pa. The above-mentioned addition of moisture can be accomplished by adjusting the flow rate of gas of a dry gas line flow meter 1 and a moisture adding line flow meter 2, by conducting temperature adjustment of a constant- temperature vessel 3, and by mixing the gas of the above-mentioned two lines. As a result, the contamination, defect and the like in the semiconductor and a semiconductor manufacturing device can be evaluated accurately, and a highly precise quality inspection can be conducted on the semiconductor substrate and the semiconductor manufacturing device.;COPYRIGHT: (C)1994,JPO&Japio