Laser microbeam machine for acting on thin film objects, in particular for recording and depositing material by chemical route in the presence of a reactive gas.

摘要

The machine according to the invention comprises a RECINTO ESTANCO (10) which is fixed a microscope objective (34) RECEIVING A LASER BEAM (36) through a transparent TRAGALUZ (38) thick, and containing REACTOR (20) comprising a sealed box whose lid COMPRISING A TRANSPARENT TRAGALUZ (56) thin UNDER WHICH IS LOCATED THE OBJECT OF tHIN LAYER (32) A TREAT. Elements (72,80,84) allow the vacuum in the chamber (10) and the reactor (20) and keep REACTIVE GAS REACTOR. The invention applies particularly IN THE TREATMENT OF ELECTRONIC CIRCUITS, hybrid circuits, ETC ...