MICROWAVE ENERGIZED DEPOSITION PROCESS USING A PRESSURE LOWER THAN THE MINIMUM POINT PRESSURE OF THE PASCHEN CURVE

摘要

The glow discharge deposition of thin layers of materials is much more effective when carried out at a pressure (C) which is lower than the pressure of the minimum point on the Paschen curve of the disposal system (A) and a power (C) greater than the minimum power required to maintain the deposition plasma to the pressure required for said process.