PROCEDURE AND APPARATUS FOR IMPROVING A PLASMA ACCELERATOR PLATING APPARATUS USED FOR DIAMOND PLATING

摘要

A method and apparatus improved electrodeposition used for the deposition of diamond films wherein one causes the formation of a first arc between a first electrode (1 ') and an ignition element (5') connected thereto and a second arc with the first arc between the first electrode (1 ') and a second electrode (3). A plasma jet, whose power source the first electrode (1 ') is then directed towards the material (7) to be coated. The surface (10 ') where the first electrode is released the feed material is abraded continuously during the electrodeposition process, thanks to an assembly wherein the emitting surface and at least one abrasive element ( 11 ', 5') placed in contact therewith are moved relative to each other.