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PROCEDURE AND APPARATUS FOR IMPROVING A PLASMA ACCELERATOR PLATING APPARATUS USED FOR DIAMOND PLATING
PROCEDURE AND APPARATUS FOR IMPROVING A PLASMA ACCELERATOR PLATING APPARATUS USED FOR DIAMOND PLATING
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机译:用于改进用于金刚石镀覆的等离子体加速器镀覆装置的程序和设备
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摘要
method and improved apparatus for electroplating used for deposition of diamond films, which leads to the formation of a first arc between a first electrode (1) and an ignition element (5) connected to it, and a second with the aid of the first arc, between the the first electrode (1) and a second electrode (3).a plasma arc power supply, with the first electrode (1) is directed towards the material (7) to be covered.the surface (10) of the first electrode which is released on the feed material is abraded continuously in the process of electrodeposition through a fitting in which the emitting surface and at least one abrasive element (11 ', 5') are placed in contact with it. displaced in relation to one another.
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