首页> 外国专利> Low temperature process for converting silica precursor coatings to ceramic silica coatings by exposure to ammonium hydroxide or an environment to which water vapor and ammonia vapor have been added

Low temperature process for converting silica precursor coatings to ceramic silica coatings by exposure to ammonium hydroxide or an environment to which water vapor and ammonia vapor have been added

机译:通过暴露于氢氧化铵或已添加水蒸气和氨蒸气的环境将二氧化硅前体涂料转化为陶瓷二氧化硅涂料的低温工艺

摘要

This invention relates to a method of forming a ceramic coating on a substrate. The method comprises coating the substrate with a solution comprising a solvent and a silica precursor followed by evaporating the solvent to form a preceramic coating. The preceramic coating is then exposed to an environment comprising ammonium hydroxide or an environment to which water vapor and ammonia vapor have been added to facilitate conversion of the silica precursor to the ceramic coating. The preceramic coating is then subjected to a temperature sufficient to facilitate conversion of said preceramic coating to a ceramic coating.
机译:本发明涉及在基底上形成陶瓷涂层的方法。该方法包括用包含溶剂和二氧化硅前体的溶液涂覆基材,然后蒸发溶剂以形成陶瓷前涂层。然后将预陶瓷涂层暴露于包含氢氧化铵的环境或已向其中添加水蒸气和氨蒸气以促进二氧化硅前体向陶瓷涂层转化的环境。然后使预陶瓷涂层经受足以促进所述预陶瓷涂层转变成陶瓷涂层的温度。

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