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Processes depending on plasma discharges sustained in a helical resonator
Processes depending on plasma discharges sustained in a helical resonator
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机译:取决于螺旋共振器中维持的等离子体放电的过程
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摘要
Plasma etching and deposition is accomplished utilizing a helical resonator constructed with an inner diameter coil greater than 60 percent of the outer shield diameter. The diameter of the conductor used to form the coil is not critical and can be less than 40 percent of the winding pitch in some applications. These parameters permit helical resonator plasma sources to be more compact and economical, and facilitate improved uniformity for processing large substrates.
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