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Magneto optical storage device using a multi-layer film of Pt/Co laminated sections

机译:使用Pt / Co层叠部的多层膜的磁光存储装置

摘要

A magneto-optical storage device having a configuration wherein a first AlN film, a Pt/co multi-layer film formed by alternately depositing Pt and Co, a second AlN film, and an Al reflective film are successively laminated on a substrate in this order. Assuming that respectively the thickness of the first AlN film is &dgr;AlN (1); that of the second AlN film is &dgr;AlN (2); that of the Pt single layer is &dgr; Pt; that of the Co single layer is &dgr;Co; and the total thickness of the Pt/Co multi-layer film is &dgr;Pt/Co, each thickness of those layers is set to range within: 50 nm ≦&dgr;AlN (1)≦200 nm; 120 nm. ltoreq. &dgr;AlN (2)≦140 nm; 0.6 nm≦&dgr;Pt≦1.0 nm; 0.3 nm≦&dgr;Co≦ 0.6 nm; and 15 nm≦&dgr;Pt/Co. ltoreq.20 nm. In accordance with the above arrangement, it is possible to greatly widen the tolerances of the film thicknesses of the first and second dielectric layers for obtaining a predetermined reflective index as well as a maximum Kerr rotation angle. Consequently, without strictly controlling the film thicknesses of the first and second AlN films, a magneto-optical storage device with stable performance suitable for practical use can be produced easily.
机译:具有以下结构的磁光存储装置,其中,第一AlN膜,通过交替沉积Pt和Co形成的Pt / co多层膜,第二AlN膜和Al反射膜依次依次层叠在基板上。假设第一AlN膜的厚度分别为dAlN(1);第二AlN膜的膜厚是& AlN(2); Pt单层的是&dgr;铂Co单层的是&dgr; Co;并且,Pt / Co多层膜的总厚度为& Pt / Co,并且这些层的各厚度被设定为50nm&lE& AlN(1)≦ 200nm; 120纳米ltoreq。 &dgr; AlN(2)≦ 140 nm; 0.6 nm≦&dgr; Pt≦ 1.0 nm; 0.3 nm≦&dgr; Co≦ 0.6纳米和15 nm≦ dt / Co。 ≥20nm根据上述布置,可以极大地拓宽第一介电层和第二介电层的膜厚度的公差,以获得预定的反射率以及最大的克尔旋转角。因此,在不严格控制第一和第二AlN膜的膜厚的情况下,可以容易地制造出具有适于实际使用的稳定性能的磁光存储装置。

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