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DEVICE MODEL OF MOSFET AND PARAMETER EXTRACTION METHOD

机译:MOSFET的器件模型及参数提取方法

摘要

PURPOSE: To provide a high-accuracy modeling method in a wide gate-voltage region and in a wide gate-length range as the drain current model of a MOSFET, for current simulation, which is used to design an LSI. ;CONSTITUTION: A drain current is expressed by an analytical-expression model whose constituent elements are composed of a mobility which is dependent on a threshold voltage, on a diffused layer resistivity and on a gate voltage and of a gate-diffusedlayer overlap length which is dependent on the gate voltage. In a parameter extraction method, a model parameter for the constituent elements is decided in such a way that the gate-voltage-dependence of the inclination ρ of channel resistance-to-gate length dependence near a part at a drain voltage of zero and of a channel resistance γ at a gate length of zero is measured, that the mobility is decided by the reciprocal number of diffused-layer resistivities γo, ρ at ρ of zero and that the gate-diffused-layer overlap length is decided by an expression of (γ-γo)Vge/ρ.;COPYRIGHT: (C)1995,JPO
机译:目的:提供一种在宽栅极电压区域和宽栅极长度范围内的高精度建模方法,作为MOSFET的漏极电流模型,用于电流仿真,用于设计LSI。组成:漏极电流由分析表达式模型表示,其组成元素由取决于阈值电压,扩散层电阻率和栅极电压的迁移率组成,栅极扩散层的重叠长度为取决于栅极电压。在参数提取方法中,以这样的方式确定构成元件的模型参数,使得在漏极电压为零且漏极电压为零的部分附近,沟道电阻与栅极长度的倾角ρ的倾斜度ρ与栅极电压相关。测量栅极长度为零时的沟道电阻γ,迁移率由扩散层电阻率γ o 的倒数决定,ρ在ρ为零时确定,并且栅极扩散层重叠长度由(γ-γ o )Vge /ρ。的表达式决定;版权:(C)1995,JPO

著录项

  • 公开/公告号JPH07176740A

    专利类型

  • 公开/公告日1995-07-14

    原文格式PDF

  • 申请/专利权人 NEC CORP;

    申请/专利号JP19930322519

  • 发明设计人 SAITO TOSHIYUKI;

    申请日1993-12-21

  • 分类号H01L29/78;H01L21/336;G01R31/26;

  • 国家 JP

  • 入库时间 2022-08-22 04:27:58

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