首页> 外国专利> METHOD FOR CONTROLLING VACUUM ARC DESCALING BY MAGNETIC FIELD AND DEVICE THEREFOR

METHOD FOR CONTROLLING VACUUM ARC DESCALING BY MAGNETIC FIELD AND DEVICE THEREFOR

机译:磁场控制真空电弧除垢的方法及装置

摘要

PURPOSE: To make surface roughness fine by executing vacuum arc descaling by a magnetic field in which an arc is oscillated by acting an alternating field having the component of the line of magnetic force which is orthogonally crossed to an arc on the arc at the time of treating the surface of metal by discharging the vacuum arc on a material to be treated. ;CONSTITUTION: The anode electrodes 2 are provided as an electrode pair, the material 1 to be treated is connected to the cathode and a discharge arc is formed between the anode electrode 2 of the positive pole and the material 1 to be treated of the cathode. Arc shield plates 4-1, 4-2 are interposed between magnetic field generating coils 3-1, 3-2 provided on the anode. Since the magnetic field which is orthogonally crossed to an arc current is present, electromagnetic force acts on the arc in the direction of a vector product of the arc current and magnetic field and the arc is moved. Since the magnetic field is the alternating field, the force which acts on the arc is reversed at a timewise period and a reciprocating movement is inducted. The arc spot is moved, so the arc spot can not locally stay at the cathode on the material to be treated and deep molten pool is not made. In this way, local excess melting is prevented and the surface roughness is made fine and uniform.;COPYRIGHT: (C)1995,JPO
机译:用途:通过在磁场作用下对磁场进行电弧使真空电弧除鳞,从而使表面粗糙度微细,在磁场作用下,交变磁场的作用力是与磁力线正交的,与磁力线正交的分量通过释放待处理材料上的真空电弧来处理金属表面。 ;组成:阳极电极2作为电极对提供,待处理的材料1连接到阴极,并且在正极的阳极电极2和阴极的待处理材料1之间形成放电电弧。电弧屏蔽板4-1、4-2介于设置在阳极上的磁场产生线圈3-1、3-2之间。因为存在与电弧电流正交的磁场,所以电磁力沿电弧电流和磁场的矢量积的方向作用在电弧上,并且电弧移动。由于磁场是交变磁场,因此作用在电弧上的力会在一定的时间周期内反转,并引起往复运动。电弧点是移动的,因此电弧点不能局部停留在待处理材料的阴极上,并且不会形成深熔池。这样,可以防止局部过量熔化,并使表面粗糙度细而均匀。;版权所有:(C)1995,日本特许厅

著录项

  • 公开/公告号JPH07236909A

    专利类型

  • 公开/公告日1995-09-12

    原文格式PDF

  • 申请/专利权人 NIPPON STEEL CORP;

    申请/专利号JP19940030232

  • 申请日1994-02-28

  • 分类号B21B45/06;B08B7/00;C23C4/00;C23F4/02;

  • 国家 JP

  • 入库时间 2022-08-22 04:26:25

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