首页> 外国专利> METHOD FOR GROWING MULTIELEMENT SEMICONDUCTOR CRYSTAL, PSEUDO PIPE CLOSING METHOD OF BLANK MOLECULE AND GROWTH DEVICE FOR MULTIELEMENT SEMICONDUCTOR CRYSTAL

METHOD FOR GROWING MULTIELEMENT SEMICONDUCTOR CRYSTAL, PSEUDO PIPE CLOSING METHOD OF BLANK MOLECULE AND GROWTH DEVICE FOR MULTIELEMENT SEMICONDUCTOR CRYSTAL

机译:多元素半导体晶体的生长方法,多元素半导体晶体的空白分子的伪管封闭和生长装置

摘要

PURPOSE: To obtain a homogeneous multielement semiconductor crystal at a low cost by immersing a prescribed substrate into a crystal blank melt and growing the crystal while pulling up the substrate at a speed adaptive to the precipitation speed of this multielement semiconductor crystal. ;CONSTITUTION: The blank melt 2 in which the blank exists in the form of HgTe and CdTe is packed into a quartz vessel 1a. Next, the CdTe substrate 5 is mounted at a substrate holder 6 and a shaft 4 is lowered to immerse the substrate 5 into the melt 2. The multielement semiconductor crystal is then grown on the substrate 5 while the shaft 4 is pulled up at the speed adaptive to the precipitation speed of the multielement semiconductor crystal. On the other hand, the blank melt of the multielement semiconductor is housed into a heat resistant vessel and thereafter, a sealing jig consisting of a heat resistant material to narrow the spacing between the shaft and the heat resistant vessel is installed in this vessel. The temp. of the space between this sealing jig and the heat resistant vessel is then set higher than the temp. of the space near the blank melt and the liquid surface of the blank melt, by which the vessel is pseudo-closed and the part above the liquid surface is maintained in a good atmosphere.;COPYRIGHT: (C)1995,JPO
机译:目的:通过将指定的基板浸入晶体毛坯熔体中并生长晶体,同时以适合该多元素半导体晶体沉淀速度的速度提起基板,从而以低成本获得均质的多元素半导体晶体。 ;组成:以HgTe和CdTe形式存在的坯料熔体2被装进石英容器1a中。接下来,将CdTe衬底5安装在衬底保持器6处,并降低轴4,以将衬底5浸入熔体2中。然后,以一定速度将轴4提起,在衬底5上生长多元素半导体晶体。适应多元素半导体晶体的沉淀速度。另一方面,将多元素半导体的坯料熔体容纳在耐热容器中,然后,在该容器中安装由耐热材料构成的密封夹具,该密封夹具使轴和耐热容器之间的间隔变窄。温度然后将该密封夹具和耐热容器之间的空间的最大温度设定为高于温度。毛坯熔体附近的空间和毛坯熔体的液面的空间,通过该容器伪封闭容器,并保持液面上方的部分处于良好的气氛中。;版权所有:(C)1995,JPO

著录项

  • 公开/公告号JPH07215792A

    专利类型

  • 公开/公告日1995-08-15

    原文格式PDF

  • 申请/专利权人 FUJITSU LTD;

    申请/专利号JP19940008932

  • 发明设计人 ITO MICHIHARU;

    申请日1994-01-31

  • 分类号C30B15/22;C30B29/48;H01L21/208;

  • 国家 JP

  • 入库时间 2022-08-22 04:25:46

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