FORMING METHOD OF NANO SIZE DOT PATTERN BY ELECTRON BEAM HOLOGRAPHY AND LITHOGRAPHY EQUIPMENT

摘要

PURPOSE:To improve position precision and simplify a process, by forming a dot pattern by using a one-body type biprism wherein two biprisms which are perpendicularly intersect each other are formed in an unified body or a multibiprism which is formed similarly by using two sets of a plurality of biprisms. CONSTITUTION:Electron beam biprisms 103 formed in an unified body are arranged. On a resist coated substrate 105 arranged just under the biprisms, electron beam interference patterns are made to interfere with each other by the respective biprisms, and an interference pattern of dots is formed. This pattern is recorded on resist 104 as the photosensitive material on the substrate 105.