PURPOSE: To equalize the temperature in a boat arrangement part even if a wall deposition is produced during the film forming step by a method wherein an exhaust port and an aperture are provided in the same region of the boat arrangement part either upward or downward part for mounting the wafers to be treated. ;CONSTITUTION: A quartz boat 15 wherein wafers 17 to be treated are contained downward in a constant direction at a specific interval is arranged in an inner tube 12. Besides, a nozzle 16 is arranged along the boat 15 while a jetting port feeding a reaction gas is provided on the surface of the nozzle 16. Furthermore, an inner aperture part 19 for exhausting the reaction gas used for the film forming step is provided on the apex of the inner tube 12. On the other hand, an outer tube 11 is mounted on a flange 11a through the intermediary of a packing rubber while an exhaust port 13 is provided on the apex of the tube 11 to be connected to a vacuum exhaust mechanism outside a furnace. Accordingly, a wall deposition even if produced can be restricted to a region where neither its position, nor its size disturb the evenness of the temperature of the boat arrangement part.;COPYRIGHT: (C)1995,JPO
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