METHOD FOR POLISHING OF A SURFACE OF COPPER OR MAINLY COPPER CONTAINING ALLOY, SOLENOID manufacturable USING THE METHOD, RÖNTGENSTRALINGCOLLIMEREND ELEMENT AND X-RADIATION REFLECTIVE ELEMENT BOTH WITH AN UNDER THE METHOD OF POLISHED SURFACE AND POLISH SUITABLE FOR APPLICATION IN THE PROCESS.

摘要

A method of polishing a surface of copper or an essentially copper-containing alloy, magnetic head which can be produced by using the method, röntgenstralingcollimerend element, and X-ray radiation-reflecting element, both provided with a according to the method polished surface and polishing agent suitable for use in the method. A method for polishing a surface (5a) for copper or an essentially copper-containing alloy, in which a polishing agent while exerting a polishing pressure of about 500 gr / cm 2 over the surface is moved in order to obtain a flat, smooth and defect-free polished surface. As a polishing agent, a composition, which contains a colloidal suspension of a SiO2 particles with a lying between 20 and 50 nm average particle size in an alkali solution containing polishing component, demineralised water and a chemical activator, employed.