首页> 外国专利> METHOD OF POLISHING A SURFACE OF COPPER OR AN ALLOY COMPRISING MAINLY COPPER, MAGNETIC HEAD OBTAINABLE BY MEANS OF SAID METHOD, X-RAY RADIATION-COLLIMATING ELEMENT, BOTH HAVING A SURFACE POLISHED BY MEANS OF THE METHOD, AND POLISHING MEANS FOR USE IN THE.

METHOD OF POLISHING A SURFACE OF COPPER OR AN ALLOY COMPRISING MAINLY COPPER, MAGNETIC HEAD OBTAINABLE BY MEANS OF SAID METHOD, X-RAY RADIATION-COLLIMATING ELEMENT, BOTH HAVING A SURFACE POLISHED BY MEANS OF THE METHOD, AND POLISHING MEANS FOR USE IN THE.

机译:抛光铜或包含铜的合金的表面的方法,可以通过有效方法获得的磁头,X射线辐射-聚积元素,均具有通过该方法进行了抛光的表面以及用于其中的抛光方法。

摘要

the invention is a procedure and polu00edrozu00f3szert gives ru00e9zru00e9teg (5) or fu0151ku00e9ntrezet polu00edrozu00e1su00e1ra containing alloy surface, where the surface (5a) and a polu00edrozu00f3eszku00f6zt compacted to move relative to each other.there is a kolloidszuszpenziu00f3 polu00edrozu00f3u00f6sszetevu0151 apolu00edrozu00f3szer kompozu00edciu00f3ju00e1ban than that between 20 and 50 nm sio2 u00e1tlagmu00e9retu0171 szemcsu00e9kvalamilyen alku00e1lioldattal formthe product contains su00f3mentesvizet and chemical activator of hydrogen peroxide, a szervesperoxid, hypochlorite or a combination of these.the polu00edrozu00f3szerben 100tu00e9rfogategysu00e9g polishing components, 60u2013100 tu00e9rfogategysu00e9g salt-free vu00edzu00e9s 25-50 tu00e9rfogategysu00e9g chemical activator.the polishing elju00e1ru00e1shoz4u20136 n / cm2 per unit power is applied between u00f6sszenyomu00f3 egypolu00edrozu00f3szert host polu00edrozu00f3eszku00f6zzel, a40 and shore d hardness shore which falls between 90.this procedure is used in the polu00edrozhatu00f3kjelu00e1tvitelben magnetic heads, and visszaveru0151tu00fckru00f6k kollimu00e1torok ru00f6ntgensugarakhoz,where are those of a substrate (1) kialaku00edtottru00e9zru00e9teg (5) on the surface (5a) are polished. a
机译:本发明是一个过程,pol u00edroz u00f3szert给出r(5)或包含合金表面的pol u00edroz u00e1s u00e1ra合金表面,其中表面(5a)和pol u00ed u00f6zt压缩为彼此相对移动。有一个kolloidszuszpenzi u00f3 pol u00edroz u00f3 u00f6sszetev u0151 apol u00edroz u00f3szer kompoz u00edci u00 elag m00 e00 e00 n e00 e00 ee e00 e00 9 u0171 szemcs u00e9kvalamilyen alk u00e1littleattal形式的产品包含s u00f3mentesvizet和过氧化氢的化学活化剂,szervesperoxid,次氯酸盐或它们的组合.pol u00edroz u00f3szerben 100t u00e9efos g00e9egate u00e9g无盐v u00edz u00e9s 25至50 t u00e9rfogategys u00e9g化学活化剂。抛光ej u00e1r u00e1shoz4 u20136 n / cm2每单位功率应用于 u00f6sszenyom u00f3ed yypol pol u00edroz u00f3esz k u00f6zzel,a40和肖氏d硬度肖氏硬度均介于90之间。此程序用于pol u00edrozhat u00f3kjel u00e1tvitelben磁头和visszaver u0151t u00fckr u00f6k kollim u00eoztornt其中r u00f6抛光表面(5a)上的基底(1)kialak ttottr u00e9zr u00e9teg(5)。一种

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