首页> 外国专利> Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenol

Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenol

机译:感光正或负作用层-续取代重氮树脂,聚合树脂和受阻酚或多酚

摘要

Light-sensitive positive-acting layer comprises 4- and/or 5-substd. diazo resin, polymeric resin and hindered phenol or polyphenol having a mol.wt. higher than 108. Processed for obtaining negative and positive images are also claimed. Pref. (a) Negative image: process comprises imagewise exposing through an original, material contg. a light-sensitive layer as claimed, heating it to render the exposed portion alkali-insol., cooling it, totally exposing it to light and developing it with an alkaline developer; (b) Positive image: process comprises imagewise exposing, through an original, a material contg. a light-sensitive layer as claimed and developing it with an alkaline developer.
机译:光敏正作用层包含4-和/或5-取代基。重氮树脂,聚合物树脂和具有分子量的受阻酚或多酚。高于108。还要求为获得负片和正片进行处理。首选(a)负片图像:此过程包括通过原始的连续素材进行图像曝光。 10,如权利要求1所述的感光层,将其加热以使曝光部分呈碱性,冷却,使其完全曝光并用碱性显影剂显影。 (b)正像:该过程包括通过原件以图像方式曝光连续的材料。要求保护的光敏层,并用碱性显影剂显影。

著录项

  • 公开/公告号IT1255551B

    专利类型

  • 公开/公告日1995-11-09

    原文格式PDF

  • 申请/专利权人 MINNESOTA MINING AND MANUFACTORING COMPANY;

    申请/专利号IT1992MI02441

  • 发明设计人 PIRO MARIO;

    申请日1992-10-26

  • 分类号6G03CA;

  • 国家 IT

  • 入库时间 2022-08-22 04:17:49

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