首页> 外国专利> RECYCLABLE MIXTURE FOR INFLUENCE OF IRRADIATION AND ITS USE TO OBTAIN STABLE RELIEF STRUCTURES AT HIGH TEMPERATURES.

RECYCLABLE MIXTURE FOR INFLUENCE OF IRRADIATION AND ITS USE TO OBTAIN STABLE RELIEF STRUCTURES AT HIGH TEMPERATURES.

机译:可重复使用的混合物,对辐射有影响,并且可用于在高温下获得稳定的释放结构。

摘要

THE INVENTION IS RELATED TO A MIXTURE CROSSED THROUGH RADIATION USED FOR THE PRODUCTION OF HIGH TEMPERATURE RESISTANT STRUCTURES AND COMPOSED (I) AT LEAST OF A POLYMER, HUEEROZYCLE, ENIREXES, ENERGY, AND SOUTHEAST ENVIRONMENTS POLAR ORGANIC SOLVENTS, (II) AN ETHYLENEICALLY COPOLYMERIZABLE TERTIARY SULPHONIC SALT, (III) A PHOTO INITIATING SYSTEM OR A PHOTO INITIATOR (IV) AT LEAST AND A POLAR APPROTICAL ORGANIC SOLVENT. THE MIXTURE IS SUITABLE FOR THE PRODUCTION OF HIGH-TEMPERATURE RESISTANT RELIEF STRUCTURES.
机译:本发明涉及用于生产耐高温结构的贯穿辐射的混合物,其由以下组成:(I)至少是聚合物,水溶态,烯属,能量和东南环境的聚烯属聚合物,聚烯丙基烯醇,聚烯丙基烯醇(C),聚烯丙基(C),聚烯丙基(C),聚烯属(C),聚烯属(C),聚烯属(C),聚丙烯酸(C),聚(C),聚(C),聚(C),聚(C),聚(C),(C)磺化盐,(III)至少一种光引发体系或光引发剂(IV),以及极性有机有机溶剂。该混合物适合于生产耐高温释放结构。

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