Method of producing single crystal of high-pressure phase material

摘要

Disclosed herein is a method of producing a single crystal of a high-pressure phase material having a pressure region of at least 1000 atm. in an equilibrium state at 25 DEG C. This method is characterized in that a plurality of single-crystalline plates (3, 16) of the high-pressure phase material, being so formed that crystal orientations thereof are substantially equal to each other, are arranged so that single major surfaces (3a) thereof are substantially flush with each other and crystal orientations thereof are substantially along the same direction to define a substrate (1) for serving as a core for vapor-phase growth, and a single-crystalline layer (4) of the high-pressure phase material is formed on the substrate (2) by a vapor-phase synthesis process. According to the inventive method, a single-crystalline layer (4) of the high-pressure phase material is integrally formed on the major surfaces (3a) of the plurality of single-crystalline plates (3, 16) of the high-pressure phase material whose major surfaces (3a) are substantially flush with each other. Thus, it is possible to easily obtain a homogeneous and large-sized single crystal of the high-pressure phase material having a large area.