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Isotopically pure single crystal epitaxial diamond films and their preparation

机译:同位素纯单晶外延金刚石膜及其制备

摘要

The present invention is directed to the production of single-crystal diamond consisting of isotopically pure carbon-12 or carbon-13. The product is believed to be like that diamond product in application Serial No. 448,469, but is made by a different method. In the present invention, isotopically pure single-crystal diamond is grown on a single crystal substrate directly from isotopically pure carbon-12 or carbon-13. One method for forming isotopically pure single-crystal diamond comprises the steps of placing in a reaction chamber a single crystal substrate heated to an elevated CVD diamond-forming temperature. A gaseous mixture of hydrogen and a hydrocarbon of isotopically pure carbon-12 or carbon-13 is provided in the chamber. The gaseous mixture then is at least partially decomposed in the chamber to form an isotopically-pure single crystal diamond layer on the single crystal substrate disposed therein. The thus-formed isotopically-pure single crystal diamond layer optionally may be removed from the single crystal substrate. Another method for forming isotopically-pure single-crystal diamond comprises diffusing isotopically-pure carbon-12 or carbon-13 through a metallic catalyst/solvent under high pressure to a region containing a single crystal substrate to form an isotopically-pure single-crystal diamond layer on said single crystal substrate. The single crystal substrate is stable under the high pressure and elevated temperatures used during the diffusion process. The single crystal substrates optionally may be diamond, including the isotopically-pure single-crystal diamond films formed by the inventive method disclosed herein, thus forming multi-layered diamond structures.
机译:本发明涉及由同位素纯碳12或碳13组成的单晶金刚石的生产。据信该产品类似于申请号为448,469的申请中的金刚石产品,但是是通过不同的方法制造的。在本发明中,同位素纯的单晶金刚石直接从同位素纯的碳12或碳13在单晶基质上生长。形成同位素纯的单晶金刚石的一种方法包括以下步骤:在反应室中放置加热到升高的CVD金刚石形成温度的单晶衬底。在腔室中提供了氢气和同位素纯碳12或碳13的碳氢化合物的气体混合物。然后,气体混合物在腔室中至少部分分解,以在设置于其中的单晶衬底上形成同位素纯的单晶金刚石层。这样形成的同位素纯单晶金刚石层可以任选地从单晶衬底上除去。形成同位素纯单晶金刚石的另一种方法包括在高压下通过金属催化剂/溶剂将同​​位素纯碳12或碳13扩散到包含单晶衬底的区域,以形成同位素纯单晶金刚石。在所述单晶衬底上的层。单晶衬底在扩散过程中使用的高压和高温下是稳定的。单晶衬底任选地可以是金刚石,包括通过本文公开的发明方法形成的同位素纯的单晶金刚石膜,从而形成多层金刚石结构。

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